Investigation of Borderless Contact, Silicide and Non-Silicide Resistor Structures in Sub-Quarter Micron ULSI CMOS Applications
博士 === 國立成功大學 === 電機工程學系碩博士班 === 91 === In this dissertation, we will study borderless contact (BLC) process of the silicide and non-silicide technologies for sub-quarter micron ULSI CMOS applications. The characteristics of a new and improved borderless contact (BLC) are studied. A low-temperature...
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| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/95478127318672293038 |