Process Optimization and Electrical Characterization of High-K Gate Dielectric for ULSI Applications
博士 === 國立成功大學 === 電機工程學系碩博士班 === 91 === The characteristics of high-K dielectrics for ULSI applications have been investigated. Additionally, optimization of technology processes has been developed to promote the characteristics of MOS devices with the high-K materials, including (a) nitrided oxide,...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25997558701556284832 |