Investigation of InP-based high electron mobility transistor using InGaAs and InGaAsP channel

碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 91 === In this paper, we have successfully improved the breakdown characteristics of InP lattice matched HEMT by using the undoped cap layer and triple channel respectively. By using undoped cap layer we can reduce the electric field between drain and gate. Due to...

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Bibliographic Details
Main Authors: En-Go Ro, 羅炎國
Other Authors: Wei-Chou hsu
Format: Others
Language:en_US
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/32333495645205187797