Evaluation of Arsenic Exposure Improvement Program for the Preventative Maintenance of Ion Implanter
碩士 === 國立臺灣大學 === 職業醫學與工業衛生研究所 === 90 === Ion implantation is a critical process in semiconductor fabrication. Usually, the elements of group III and V(A) of the periodical table are the choice for dopants in this process. Among them, arsenic was used more frequently comparing with others. After a p...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/24370834611908771626 |