Repeated Spike Technology in Rapid Thermal Processing and Mechanical Stress Effect on MOS Capacitor WithThin Gate Oxides.
博士 === 國立臺灣大學 === 電機工程學研究所 === 90 === A novel repeated spike oxidation (RSO) technique was employed in RTP system. Simulation results predict both the temperature distributions on wafer and in chamber would be improved by this RSO method. It is suggested that the improvement in wafer temperature uni...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/61082113322664949375 |