Electrical Properties of Gate N/O layer formed by LPCVD with N2O RTP

碩士 === 國立清華大學 === 工程與系統科學系 === 90 ===

Bibliographic Details
Main Authors: Chia-Lung Hsu, 許嘉倫
Other Authors: Tien-Ko Wang
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/75993052467449387276