Study of Resist Scaling Down and Characterization Technology
碩士 === 國立清華大學 === 原子科學系 === 90 === In this study, we had been proved the application of chemical shrink technique in the electron shaped beam lithography is practicable. The chemical shrink reaction is catalyzed by the photoacid in the resist. During the mixing bake step, the cross-linker undergoes...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55490208952873998455 |