The study of Ta2O5 thin film deposited on Pt(O) electrode by selective chemical vapor deposition
碩士 === 國立清華大學 === 材料科學工程學系 === 90 ===
Main Author: | 黃維邦 |
---|---|
Other Authors: | 吳泰伯 |
Format: | Others |
Language: | zh-TW |
Published: |
2002
|
Online Access: | http://ndltd.ncl.edu.tw/handle/38214179055799347533 |
Similar Items
-
Study on the Influence of Various Bottom Electrode Materials to the characteristics of Ta2O5 Thin Film Deposited by Chemical Vapor Deposition
by: Ya-Huang Huang, et al.
Published: (2001) -
The Study on the Influence of Various Bottom Electrode Materials to Ta2O5 Thin Films Deposited by Chemical Vapor Deposition for DRAMs Applications
by: Tzu-Ping Liu, et al.
Published: (2002) -
Characterization of Plasma-Enhanced Chemical Vapor Deposition of Ta2O5 Dielectric Thin Films
by: Yi-Sheng Lai, et al.
Published: (1999) -
The Study of (Ta2O5)1-x_(TiO2)x Thin Films Deposited by Chemical Vapor Deposition for DRAMs Applications
by: Chich-Shang Chang, et al.
Published: (2000) -
Hot-filament chemical vapor deposition of selectively deposited diamond and silicone thin films
by: Kwan, Michael Chiu, 1969-
Published: (2009)