Metal-Organic Chemical Vapor Deposition of Titanium Dioxide and Aluminum Titanate Thin Films

碩士 === 國立東華大學 === 材料科學與工程學系 === 90 === Abstract Thin film technology has been widely applied in semiconductor and electro-optic industries and on the fine machinery to have materials in a small size and/or in new functions with high pay-off. In this study, chemical vapor deposition (CVD) techn...

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Bibliographic Details
Main Authors: CHENG-NAN HSUEH, 薛正男
Other Authors: Dong-Hau Kuo
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/92011522089339141362