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碩士 === 國立中央大學 === 光電科學研究所 === 90 === Abstract We have deposited Ta2O5 and SiO2 films by ion-beam sputtering. By measuring Ta2O5 and SiO2 films, we find that thin films deposited by ion-beam sputtering have several advantages. 1.High packing density. 2.Refractive index steady. 3.Low scattering loss....
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/81693703786751476275 |