Study of bottom anti-reflection coated and Fabry-Perot type anti-reflection coated on photomask for vacuum ultraviolet lithography
碩士 === 國立中央大學 === 光電科學研究所 === 90 === There are two major parts in this thesis. One is to establish the anti-reflection coating technique for using in vacuum ultraviolet photomask . The other is to investigate the bottom anti-reflection coating. In the development of the anti-reflection coati...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55648599084481806528 |