Determination of ultra-trace impurities in semiconductor-grade chemicals by inductively coupled plasma mass spectrometry following a concentration pretreatment technique
碩士 === 國立中央大學 === 化學研究所 === 90 === The metallic impurity level of process chemical for integrated circuits industry is getting lower, particularly as the industry moves to larger wafer size and smaller line-widths. To avoid contamination of the wafer surface by the cleaning solution itself, the pur...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
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2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/35230127812038052158 |