The modification of the organic resist after incorperate inorganic nano particles
碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 90 === ABSTRACT In this paper, we characterize DES-1010 E-Beam resist for high-resolution electron beam lithography from low to high dose energy. Results indicate the DSE-1010 is very high sensitive for high throughput E-Beam lithography applications. In general,...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/74660578474600974542 |