Electro-Chemical Process for Treatment of Chemical Mechanical Polishing Wastewater
碩士 === 國立交通大學 === 環境工程所 === 90 === Because of its capability to achieve both global and local planarization that meets the increasing stringent lithographic requirement, Chemical Mechanical Polishing (CMP) has become an integral process in the manufacturing of multi-level integrated circuit device i...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/08116194101992974524 |