High Reliability Thin Oxides Prepared with the Disilane-based Polysilicon Films and CF4 Plasma Pre-treatment
博士 === 國立交通大學 === 電子工程系 === 90 === Abstract For mobile electronics systems, the EEPROM of high density, low operating voltage and good reliability is needed. To meet the above requirements, a high reliable polyoxide, a Ni-polycide of good thermal stability, and a tunnel oxide with a large...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2001
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/62525397417907237323 |