Synthesizing Various Types Nanosize Zirconia Formulated Slurry and Study of Their Effects on Cu- and STI- Chemical Mechanical Polishings
碩士 === 國立交通大學 === 材料科學與工程系 === 90 === Various types zirconia formulated slurries were investigated for copper chemical mechanical polishing (Cu-CMP) and shallow trench isolation chemical mechanical polishing (STI-CMP) processes. Cu-CMP was investigated with slurries containing YxZr1-xO2-x...
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| Format: | Others |
| Language: | en_US |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70877016741296118827 |