Fabrication of Low Stress HDP-CVD Silicon Nitride Films in MEMS Application
碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 90 === Abstract High density plasma chemical vapor deposition (HDP-CVD) is an newly thin film process for the fabrication of microelectromechanical systems (MEMS). The HDP film has many excellent film properties than the PECVD film. However, thin film materials...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/em5yv9 |