Influences of thermal processes and bottom electrodes on the characteristics of Ta2O5 capacitors
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 90 === Abstract Characteristics of Ta2O5 thin-film capacitors on various bottom electrodes, were investigated in this thesis. The bottom electrodes include poly-Si, TaN, TiN and Ru, and the capacitors were characterized before and after annealing at 500°C or 700...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/b73w7n |