利用sol-gel（溶膠-凝膠法）製作矽質薄膜之研究

• Main Author: 謝峰欣
• Other Authors: 曾文甲
• Format: Others
• Language: zh-TW
• Published: 2001
• Online Access: http://ndltd.ncl.edu.tw/handle/31487723401470489219

碩士 === 中國文化大學 === 材料科學與製造研究所 === 89 === The fabrication of silica thin film can be carried out by sol—gel process. This method is simple、low cost、rapid、well-controllable and compatible with existing fabrication technologies. The silica thin film was made from mixing of TEOS、H2O、C2H5OH and HCl as a precursor. By changing C2H5OH/ H2O、H2O /TEOS weight ratio, we prepared several formula and compared their rheological behaviors and coating quality. The films were formed by spin coating on glass substrates. Our result showed that as the TEOS: C2H5OH: H2O kept at 1:1.6:1-2, the film can be formed uniformly without apparent crack（spin rate =6000 r.p.m.）. When adding nickel powder（0.3μm and nm sized）into the sol, the viscosity of the suspension increased significantly after ball mixing. After mixing 48 hours, viscosity of nm Ni formula was higher than that of the 0.3μm Ni formula. We used these formula to form thin films and found the 0.3μm Ni film flatness is smoother than the nm Ni film by AFM（solids loading kept constant at 3vol%）.