Study of the fabrication of nanometric aperture size near-field optical fiber probes and nanometric near-field optical nanolithography

碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 89 === Based on the principle of near-field optics, nanometric near-field optical writing for lithography will be developed in this article. Diffraction limit (about half of the wavelength) of the conventional far-field optics will be no longer limited by...

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Bibliographic Details
Main Author: 范植鈞
Other Authors: Po-Cheng Kuo
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/70159086932112409593