Effects of Preparation Condition on Mesoporous Low-k Film Properties
碩士 === 國立臺灣大學 === 化學工程學研究所 === 89 === As feature size is down to the deep submicron region,the performance of integrated circuit devices will be significantly limited by the interconnect delay(i.e. RC delay).Using the material with the lower dielectric constant can be a potential solution to reduce...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13801663787149536425 |