Study of Multi-Layer Bottom Antireflective Coatings and Substrate Contamination Effects in Deep UV Lithography
碩士 === 國立海洋大學 === 光電科學研究所 === 89 === We propose a new multi-layer bottom antireflective coating (BARC) structure for deep-UV lithography. The mulit-layer BARC structure is composed of TEOS oxide and silicon nitride or silicon oxynitride films. The top TEOS oxide layer is a base contamination free ma...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79398812115918523933 |