Study of Plasma Etching on 300mm Inductively Coupled Plasma Etcher
碩士 === 國立清華大學 === 工程與系統科學系 === 89 === In this thesis ,we use Central Composite Design and Orthogonal Array to arrange the experiments.The parameters of etching rate include ICP power、Bias power、flow rate and pressure. Besides,we use spectrometer and RF impedance meter to measure plasma intensity and...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/04405263728158955844 |