Characterization and Fabrication of Recessed Multi-Gate SOI MOSFET

碩士 === 國立中山大學 === 電機工程學系研究所 === 89 === Abstract In this thesis, we propose and fabricate a triple recessed multi-gate SOI device that has high transconductance and low series resistance. The SOI device structure has three unique features. First, it uses mesa isolation instead of using conventi...

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Bibliographic Details
Main Authors: Shih-Chang Chang, 張世昌
Other Authors: Jyi-Tesong Lin
Format: Others
Language:en_US
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/37815733931416557284