The study of UV thin film prepared reactive by RF magnetic controlled sputtering with IAD
碩士 === 國立中央大學 === 光電科學研究所 === 89 === The study of Al2O3 and SiO2 optical thin films prepared by RF magnetron sputtering system with IAD was concerned in this thesis. Due to IAD, we can see the change on optical properties including refractive index、extinction coefficient and transmittance along with...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/78763941568108179388 |