CF4 Abatement by Packed Bed Plasma Reactors
碩士 === 國立中央大學 === 環境工程研究所 === 89 === Due to rapid growth in semiconductor manufacturing process such as etching and chemical vapor deposition (CVD) clean over these years, innovative technologies are needed to reduce the corresponding increase in chemicals used like perfluorocompounds (PFCs) that wo...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/08478467203336568663 |