Copper contamination effect on gate insulator integrity
博士 === 國立交通大學 === 電子工程系 === 89 === This dissertation addresses the issues related to copper (Cu) contamination effects especially induced by the process of Cu interconnects in CMOS devices. First of all, we have studied the effect of copper contamination after the front-end MOS capacitor fabrication...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/09022716422140163878 |