Effects of C+ and N2+ implantation on the electrical properties of liquid phase deposition Si(O,F) films
碩士 === 國立成功大學 === 材料科學及工程學系 === 89 === Abstract Effects of C+ and N2+ implantation on the electrical properties of liquid-phase-deposition (LPD)Si(O,F) films as a function of the ion dose were studied. Upon C+ implantation some Si-F bonds were decomposed concurrently with the f...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2001
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| Online Access: | http://ndltd.ncl.edu.tw/handle/74686085795005727683 |