Optimal Design and Characterization of a Nanometer Positioning Stage

碩士 === 國立中興大學 === 機械工程學系 === 89 === Along with the fast growing of semiconductor and precision-manufacturing industry, high precision and high performance devices are becoming more necessary. In which, the precision micro-positioning system is an essential role. Many researches had been focused on t...

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Bibliographic Details
Main Authors: Shih-Tse Fu, 傅世澤
Other Authors: Jau-Liang Chen
Format: Others
Language:zh-TW
Published: 2001
Online Access:http://ndltd.ncl.edu.tw/handle/16054223226170288372
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Summary:碩士 === 國立中興大學 === 機械工程學系 === 89 === Along with the fast growing of semiconductor and precision-manufacturing industry, high precision and high performance devices are becoming more necessary. In which, the precision micro-positioning system is an essential role. Many researches had been focused on the dual travel ranges coarse & fine motion stages that are used in many precision micro-positioning systems. In these systems, the coarse motion is composed by a motor with a ball screw or linear slider to drive the stage, while the fine motion is composed by piezoelectric element with other parts. Because of the dual travel ranges of coarse & fine motion stages are composed by different structures, there are many persecutions in using this kind of stage. In this research, a long-range precision micro-positioning system, which is composed by piezo-actuator, flexure structure, lever, and uses laser interferometer for position sensing, was investigated. Through out the analysis of the characterization and optimum design of the stage, a stage with total travel range of 280μm and 320μm along the X- and Y- axes, respectively, and the maximum yaw motion range of +4 mrad and —2 mrad with nano-meter accuracy, was constructed. The residual errors in X and Y-coordinate of this stage are 4.2 nm rms and 4.3 nm rms, respectively. And the accompanied yaw error is less than 1.2×10-7 rad.