Study on the Optical Paramaters and Thin Film''s Thickness by Polarization Modulation Spectroscopic Ellipsometer

• Main Authors: Zhi Feng Wang, 王志峰
• Other Authors: J.B. Shi
• Format: Others
• Language: zh-TW
• Published: 2001
• Online Access: http://ndltd.ncl.edu.tw/handle/30347364069748925231

碩士 === 逢甲大學 === 電子工程學系 === 89 === Spectroscopic ellipsometry is a well-known and powerful optical technique for obtaining the optical properties, such as dielectric functions and optical parameters of the bulk semiconductor and its thin films. Some related papers on this topic have been published. There are usually two methods to obtain optical properties. One used single wavelength method to obtain optical parameter and thickness of bulks and thin films. The other used various wavelengths to obtain optical parameter. We think it is not enough, so we want to use spectroscopic ellipsometer with polarization modulation method to obtain optical parameter and thickness of bulks and thin films. From the result of analysis and theory, we expect to set up a multifunctional ellipsometer. In this thesis, we first mention the basic optical theories, including the basic optical formula, such as the reflectance and transmittance at oblique incidence of single surface or thin-film coating. Then, we will introduce simplex method to obtain the optical parameters and thin film thickness. Then we introduce alignment of photoelastic modulator. In the end of thesis, we give some advises which are the future works can be simpler to use or more accurate.