Growth of rare earth oxides thin film by metal organic chemical vapor deposition
碩士 === 國立清華大學 === 材料科學工程學系 === 88 === The metal organic chemical vapor deposition ( MOCVD ) of several cerium-based oxides has been studied in order to prepare buffer layers tailored to the epitaxial growth of oxide. Due to the similarity of the crystal structure and the lattice constant of CeO2 to...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/33568383810376877654 |