Properties of TiSi2 Formed by CO2 Laser Annealing
碩士 === 國立清華大學 === 材料科學工程學系 === 88 === We report on direct synthesis of C54 TiSi2 films by laser irradiation from Ti deposited on Si substrates, using a CO2 laser. The films were characterized using X-Ray Diffraction(XRD), secondary ion mass spectrometer(SIMS), auger electron spectrometer(...
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13882999847701964885 |