Chemical Vapor Deposition of Niobium Carbonitride Thin Films from Alkylimidoniobium Complex

• Main Authors: Chia-Chen Wu, 吳珈臻
• Other Authors: Hsin-Tien Chiu
• Format: Others
• Language: zh-TW
• Published: 2000
• Online Access: http://ndltd.ncl.edu.tw/handle/17513467692526874786

碩士 === 國立交通大學 === 應用化學系 === 88 === The imido complexes, Nb(NR)(NEtMe)3 (R = nPr, iPr, tBu), were successfully synthesized from Nb(NR)Py2Cl3 with LiNEtMe. These complexes were characterized by NMR spectroscopy, and mass spectroscopy. Nb(NtBu)(NEtMe)3, tertbutylimidotriethylmethylamidoniobium, was used as a single-source precursor to deposit niobium carbonitride thin films on n-type Si(100) by low-pressure chemical vapor deposition between 723~923 K. XRD analysis indicated that the films exhibited polycrystalline structure. SEM and AFM studies indicated that the roughness increased with the increasing temperature of deposition. ESCA showed that binding energy of the Nb3d5/2, N1s, and C1s, were 203.8~204.2eV, 397.2~397.4eV and 282.8~283.0eV, and the composition of films was NbNxCy (x = 0.39~0.74, y = 0.67~1.47). AES studies showed that the surfaces of films were easily oxidized. Finally, we proposed possible reaction mechanisms based on the byproduct gases in identified by NMR, GC-Ms and FTIR.