The Characteristic Study of Epitaxial Lateral Overgrowth GaN by MOCVD
碩士 === 國立交通大學 === 電子物理系 === 88 === Investigating the epitaxial growth of III-V nitride compound semiconductor is lengthy. The advantages of the III-V nitride compound semiconductor are that the energy gap, lattice and the reflective index are tunable. Furthermore, the III-V nitride compou...
Main Authors: | Shih-Hsien Chuang, 莊士賢 |
---|---|
Other Authors: | Wei-I Lee |
Format: | Others |
Language: | en_US |
Published: |
2000
|
Online Access: | http://ndltd.ncl.edu.tw/handle/97763903847441791856 |
Similar Items
-
CAFM Studies of Epitaxial Lateral Overgrowth GaN Films
by: Kasliwal, Vishal P.
Published: (2007) -
The Investigation on GaN Growth byEpitaxial Lateral Overgrowth
by: ching-i chang, et al.
Published: (2005) -
Epitaxy of GaN by MOCVD and Fabrication of AlGaN/GaN MODFET
by: Chang-Yi Yang, et al.
Published: (2001) -
Epitaxial growth and characteristics study of GaN based LED by MOCVD
by: Ping-Yuan Huang, et al.
Published: (2007) -
Self-organized propagation of dislocations in GaN films during epitaxial lateral overgrowth
by: Sakai, Akira, et al.
Published: (2000)