Study of polycrystalline Silicon thin film transistors fabricated
碩士 === 國立交通大學 === 電子工程系 === 88 === The ultra high vacuum chemical vapor deposition (UHV/CVD) system can deposite poly-Si film without any laser or furnace annealing. The deposition pressure is superior to that deposited by low pressure chemical vapor deposition (LPCVD) system. The thres...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85572243134088780641 |