A Study of Deep Submicron SOI NMOSFET's
碩士 === 國立交通大學 === 電子工程系 === 88 === In this thesis, it is found that devices with thinner silicon film show a reduced reverse narrow channel effect as well as reverse short channel effect. The experimental findings can be explained by a decrease of cross-sectional silicon/oxide interface a...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02366717928715280506 |