Basic studies on the adsorption, desorption and synchrotron radiation-induced etching reactions of etchant molecules adsorbed on Si(111)(7x7) surfaces using surface analytic techniques
博士 === 國立成功大學 === 物理學系 === 88 === ABSTRACT High-resolution, anisotropic, dry etching of semiconductor materials is an important technology for highly integrated microelectronic devices. Plasma etching techniques can cause a significant amount of damage due to energetic particle bombardmen...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/22307881539616123792 |