Epitaxial Growth and Characterization of Hexagonal and Cubic Gallium Nitride Grown by Metalorganic Chemical Vapor Deposition

碩士 === 大葉大學 === 電機工程研究所 === 88 === The growth and characteristics of hexagonal and cubic gallium nitride (GaN) grown by metalorganic chemical vapor deposition (MOCVD) were investigated in this study. Optical grade polished (0001) orientation (C-face) sapphires are used as the standard sub...

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Bibliographic Details
Main Authors: Wei-Tsung Lin, 林偉宗
Other Authors: Dong-Sing Wuu
Format: Others
Language:en_US
Published: 2000
Online Access:http://ndltd.ncl.edu.tw/handle/89763388837273269727