Diffusion Modeling for Junction Formation by Ultra-Low Energy Implantation
碩士 === 長庚大學 === 電機工程研究所 === 88 === Abstract In recent years, transient enhance diffusion (TED) has been investigated in many papers. In this thesis, we focus on the TED behavior during shallow junction formation by ultra-low energy ion implantation and low temperature annea...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/77356352405453345618 |