Synthesis of Copper Films by Using Cu(hfac)(VTMOS) Metalorganic Chemical Vapor Deposition Reaction System
碩士 === 國立臺灣科技大學 === 化學工程系 === 87 === Copper films have been formed by metalorganic chemical vapor deposition (MOCVD) method using Cu-hexafluoracetylacetonate‧vinyltrimethoxysilane (Cu(hfac)‧VTMOS) as the precursor. Emphasis of this study was laid on understanding the reactivity of the pre...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/11453517996463709786 |