Study of Ultra Thin Oxide Uniformity in Rapid Thermal Processing
碩士 === 國立臺灣大學 === 電機工程學研究所 === 87 === The most important feature of rapid thermal processing (RTP) lies in its use of high energy radiation source to achieve the heating of a wafer in a rather short time (compared with the heating by a furnace). This feature plays a very important role in...
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| Format: | Others |
| Language: | zh-TW |
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1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/59666661345214255491 |