Study of IMP Ta and TaNx as diffusion barrier layer in copper metallization

• Main Authors: Graham Chuang, 莊景誠
• Other Authors: F. R. Chen
• Format: Others
• Language: zh-TW
• Published: 1999
• Online Access: http://ndltd.ncl.edu.tw/handle/70818139231678547980

碩士 === 國立清華大學 === 工程與系統科學系 === 87 ===