A Study of Plasma Enhanced Chemical Vapor Deposition Low Stress Thin Films and Thick Sacrificial Layers
碩士 === 國立清華大學 === 電子工程研究所 === 87 === This thesis is dedicated to the study of PECVD low stress films and ultra-thick sacrificial layers. By doping and adjusting the PECVD parameters such as power, temperature, pressure and the ratio of reactive gas, it can reduce the stress of the deposited films an...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25180585639775135067 |