Growth of LPD-BaTiO3 Films on Silicon Using Barium Nitrate and Hexafluorotitanic Acid
碩士 === 國立中山大學 === 電機工程學系 === 87 === Barium titanate (BaTiO3) thin films have high dielectric constant, which can be used as an insulating material in the future ultra-large scale dynamic random access memory (DRAM) and optoelectronic devices. But, high process temperature of the tradition...
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| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93343478686376594129 |