Characterization of modified restist and verification by lithographic performance
碩士 === 國立中央大學 === 化學工程研究所 === 87 === The modification of the electron-beam resist (ZEP520) after spiking with various amounts of poly(styrene-co-maleic anhydride) is characterized by the spectra of Fourier Transfer infrared red (FTIR) and ultraviolet visible (UV-VIS). The chemical structu...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/89701936797659929574 |