Thermal Stability of Cu/PAE-2(low k)/Si with and without Ta-based Barrier Layers
碩士 === 國立交通大學 === 電子工程系 === 87 === This thesis investigates the thermal stability and electrical properties of the low-k dielectric material of PAE-2 film. The dielectric constant of the PAE-2 film was determined to be 2.9 and the PAE-2 film was thermally stable up to 450oC. The thermal s...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/51448599349551030494 |