Simulation and Study on Multi-layer Photoresist in Microlithography
碩士 === 國立交通大學 === 電子工程系 === 87 === To get better resolution, in deep sub-micron lithography process, the use of multi-layer photo-resist is necessary. Because of optical interference in thin film, the shape of exposed resist has so-called swing effect. Usually, PEB (Post Exposure Bake) us...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/30568177567440167103 |