Preparation and Properties of Manganin Thin Film Resistor
碩士 === 國立交通大學 === 電子工程系 === 87 === Effect of processing variables include deposition time, substrate temperature, power, annealing temperature, annealing time on the properties of manganin thin films deposited on Al2O3 substrate or Si wafer using reactive r.f. magnetron sputtering system. We analyze...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/38601208084131121044 |