| Summary: | 碩士 === 國立成功大學 === 電機工程學系 === 87 === The major purpose of this thesis is to design several air gap low k structures to reduce the dielectric constant for advance ULSI application. Use the TMA Raphael to simulate the effective dielectric constant of the structures, and making the experiments of the process of the structures.
Base on the simulation to , the structure B, structure C and structure D, we find that the effective dielectric constant decreases with the decreasing of the spacing between the metals. It also decrease when the metal width scaled down.
Among the structures, the structure D possesses the minimum effective K value. Use the structure D to a divided by three counter circuit, the HSPICE simulated cut off frequency is 1.8GHz. Which is higher than the conventional non-air gap structure(1.65GHz) and the TI’s 1.75GHz. Although our cut off frequency is a little smaller than the Toshiba’s 1.85GHz.However, our structure provide a higher supporting strength for a multi-level interconnection with a larger number of levels.
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