A Study of Air Gap Low-k Structures for ULSI Multi-level Interconnection

碩士 === 國立成功大學 === 電機工程學系 === 87 === The major purpose of this thesis is to design several air gap low k structures to reduce the dielectric constant for advance ULSI application. Use the TMA Raphael to simulate the effective dielectric constant of the structures, and making the experiment...

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Bibliographic Details
Main Authors: J.S.Lin, 林俊聲
Other Authors: Y.K.Fang
Format: Others
Language:zh-TW
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/23237252695689559919